Study on thermal curing in ester type photosensitive polyimide.
نویسندگان
چکیده
منابع مشابه
Application of Photosensitive Polyimide: Mask Saving Process for Buffer Coating
Issues in the LSI polyimide buffer coating process which uses photosensitive polyimide also as a mask of passivation film etching are reviewed. Change of lithography wave length from g-line to i-line causes the difficulty in the polyimide patterning. However, today's improved polymers, both ester type and ionic type, have enough ability to open 10 um windows. Dry etching condition must be adjus...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1995
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.8.277